Extreme ultraviolet lithography - PDFSEARCH.IO - Document Search Engine

Extreme ultraviolet lithography
Results: 188

#	Item
111	April 11, 2003 Version 3.5 i Add to Reading List Source URL: image.gsfc.nasa.gov Language: English - Date: 2003-04-17 14:15:06 Geophysics Solar System Space plasmas Spaceflight IMAGE Extreme ultraviolet lithography Plasmasphere Energetic neutral atom Space weather Space Astronomy Planetary science
112	Microsoft Word - Advanced linear and nonlinear optical metrology in support of next.doc Add to Reading List Source URL: www.nist.gov Language: English - Date: 2010-07-21 15:47:32 Electromagnetic radiation Nonlinear optics Photolithography Next-generation lithography Dispersion Laser Extreme ultraviolet lithography Immersion lithography Optics Physics Photonics
113	JOURNAL OF GEOPHYSICAL RESEARCH, VOL. 117, A05314, doi:[removed]2011JA017399, 2012 Numerical simulations of the ionosphere of Mars during a solar flare Anthony Lollo,1,2 Paul Withers,1 Kathryn Fallows,1 Zachary Girazian, Add to Reading List Source URL: sirius.bu.edu Language: English - Date: 2012-12-20 13:40:43 Astrophysics Atmospheric sciences Ionosphere Solar flare Sudden ionospheric disturbance Plasma Extreme ultraviolet lithography Sun Climate of Mars Physics Space plasmas Plasma physics
114	PROJECT PROFILE 2T304: Lithography based on quite extreme ultra high NA 193 nm optical immersion development (LIQUID) LITHOGRAPHY Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:36:09 Immersion lithography Photolithography Extreme ultraviolet lithography 45 nanometer 65 nanometer Ultraviolet Laser Solid immersion lens Computational lithography Materials science Technology Optics
115	T405-medea+ (lo1[removed]:23 Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:37:14 Extreme ultraviolet Photolithography Ultraviolet Excimer laser X-ray lithography Laser Cymer Inc. Electromagnetic radiation Materials science Extreme ultraviolet lithography
116	PROJECT PROFILE T406: Extreme UV consortium for imaging technology (ExCITe) PROCESS EQUIPMENT Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:37:16 Microtechnology Photolithography Extreme ultraviolet Resist Ultraviolet 90 nanometer 45 nanometer Materials science Electromagnetic radiation Extreme ultraviolet lithography
117	PROJECT PROFILE T408: Mask-less mapper (MAPPER) LITHOGRAPHY Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:37:18 Visual arts Resist Lithography MAPPER Wafer Design Extreme ultraviolet lithography Semiconductor device fabrication Technology Electron beam lithography
118	T404-medea+ (LO1[removed]:14 Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:37:13 Extreme ultraviolet Ultraviolet Next-generation lithography Physics Extreme ultraviolet lithography Microtechnology Photolithography
119	PROJECT RESULT Lithography T403: Extreme UV alpha tools integration consortium (EXTATIC) Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:39:53 Extreme ultraviolet lithography Microtechnology Extreme ultraviolet Photomask Photolithography Stepper Ultraviolet Semiconductor device fabrication Extreme Ultraviolet Explorer Electromagnetic radiation Materials science Spacecraft
120	PROJECT RESULT Lithography T405: EUV sources development (EUV Sources) Add to Reading List Source URL: www.catrene.org Language: English - Date: 2009-03-25 10:39:57 Microtechnology Extreme ultraviolet Photolithography Ultraviolet Photomask Stepper Laser Semiconductor device fabrication Cymer Inc. Electromagnetic radiation Extreme ultraviolet lithography Technology

UPDATE